- All sections
- C - Chemistry; metallurgy
- C23C - Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
- C23C 16/48 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
Patent holdings for IPC class C23C 16/48
Total number of patents in this class: 513
10-year publication summary
|
64
|
72
|
58
|
50
|
54
|
50
|
35
|
49
|
23
|
16
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Applied Materials, Inc. | 16587 |
73 |
| Tokyo Electron Limited | 11599 |
20 |
| ASM IP Holding B.V. | 1715 |
16 |
| Quantum Elements Development, Inc. | 18 |
13 |
| Free Form Fibers, LLC | 38 |
11 |
| Versum Materials US, LLC | 591 |
10 |
| ASML Netherlands B.V. | 6816 |
9 |
| FEI Company | 851 |
9 |
| Kokusai Electric Corporation | 1791 |
9 |
| Varian Semiconductor Equipment Associates, Inc. | 1282 |
8 |
| Utica Leaseco, LLC Assignee | 112 |
8 |
| Samsung Electronics Co., Ltd. | 131630 |
7 |
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
7 |
| Dynetics, Inc. | 14 |
6 |
| International Business Machines Corporation | 60644 |
5 |
| The Aerospace Corporation | 439 |
5 |
| Aixtron SE | 288 |
5 |
| National University of Singapore | 2228 |
5 |
| Screen Holdings Co., Ltd. | 2431 |
5 |
| Hitachi High-Tech Science Corporation | 326 |
4 |
| Other owners | 278 |